zt Photomask substrates
}zt Photomask substrates
r늃x
l(f)˾|ݸк\WƷ˾
؛10000000
(lin)ϵˣС
l(f)؛cV| |ݸ |ݸ
l(f)rg20210531
Ч20211130
ھԃ
ھԃPھԃP
aƷCϢ|δӋ
ܰѣՈMÌHķߴʩƷҪMƷCһ棨؛SC뾳zCAC¹ڲzy棩
鿴ͬaƷ
ĪӲȣ0- aأ|ݸвɽ(zhn)
- Ʒƣ\
- Ƿṩӹƣ
- 4
- 0
- 0,0,0
- 0,0,0
- 0,0,0
P]Wk9WW˾WӹS
\WƷ˾2004꣬һн(jng)OӋWĸ߿ƼI(y)˾(jng)^İl(f)չγ˼аl(f)OӋӹzMbۺյһwϵаWʴ_aOͨ^ʩƌWĹwϵ˾߂ѸٷЈa˾Ўʮ˽MɵOӋаl(f)ģϮaƷ(j)͑Ҫаl(f)®aƷõĹWON͑OӋAˇ͑هҹ˾ڇЈкܸߵռhNWޣձn|ρЖ|^s@|ݸӋԺI(y)ЇӋƌWоԺ˜ʳߺI(y)ЇLC(sh)@g˾A|Aυ^(q)Șsu ˾ͨ^LcWxWCеOI(y)γϵлWaƷYOӋܸ(j)͑ӆƸNʴ_W˾ĮaƷ:R^ųyֳyУƬ˶壩ƽƽƽNRpRRRք_ͶӰ(sh)@aȮaƷнb䓻ɫĥɰпղNˇb ˾ʼKء|ǰÑ\ȡšּ\͑ṩĮaƷ͵ķҚgӭѵ˾늻ǢՄI(y)yֹM(chung)xͣ
Ϣ
zt Photomask substrates
Ԕf
ztһNӲģϣĤǮǰδӹĤйϣஔõĸйzƽ߹❍ȵIJͨ^ֱſ؞R䣨SPeϵt-tĤγtĤ棬Ϳһӹ¿gַQzgƳɄztztĤĻģ
ԣztиߵĸй`ȡ߷ֱȱcܶȡĥԺ坍̎ʹÉLc
aƷVڰ댧w·оƬ졢·ܶ댧wԪ@ʾWИI(y)Ĥܶӡƾ·壨PCBИI(y)ȡ





|ݸк\WƷ˾Ϣ
\WƷ˾2004һн(jng)OӋWĸ߿ƼI(y)˾(jng)^İl(f)չγ˼аl(f)OӋ졢ӹzMbۺյһwϵаWʴ_aOͨ^ʩƌWĹwϵ˾߂ѸٷЈa˾Ўʮ˽MɵOӋаl(f)ϮaƷ(j)͑Ҫаl(f)®aƷõĹWON͑OӋAˇ͑هҹ˾ڇЈкܸߵռʣhNWձn|ρЖ|^s@|ݸӋԺI(y)ЇӋƌWоԺ˜ʳߺI(y)ЇLC(sh)@g˾A|Aυ^(q)Șsu ˾ͨ^LcWxWCеOI(y)γϵлWaƷYOӋ죬ܸ(j)͑ӆƸNʴ_W˾ĮaƷ:R^ųyֳyУƬ˶壩ƽƽƽNRpRRRք_ͶӰ(sh)@aȮaƷнb䓻ɫĥɰпղNˇb̡ ˾ʼKء|ǰÑ\ȡšּ\͑ṩĮaƷ͵ķҚgӭѵ˾늻ǢՄI(y)yֹM(chung)x
IaƷԪӰyx,I(y)׃R^,˶,ֱʰ,Уʲy,ֳ,a,ֹRƬ,R,R,R,ƽƽ,ƽƽ,W_,ͶӰ,ZSyԇx ˾ݣ2010
˾W(wng)ַhttp://hcgxcy.glass.com.cn
^(q)V| |ݸ |ݸ
W(wng)ַ: http://hcgxcy.glass.com.cn
ztģ Photomask substratesaƷśr
Wǹ늼gaI(y)ĻAҪMɲe20o90ԺSWcϢƌW²ϿƌWIJںϣӻAϵĹWڹݔ⃦@ʾIđøͻwMɞϢǹϢgl(f)չĻAl֮һ(j)2013-2017ЇWИI(y)aNcͶYAy桷(sh)(j)@ʾSȽ(jng)m(x)(wn)l(f)չЇWИI(y)l(f)չѸ͡(j)ҽy(tng)Ӌ֔(sh)(j)@ʾ2010꣬WИI(y)Ҏ(gu)ģI(y)(sh)_246ИI(y)ȫꌍF(xin)N234.05|ԪͬL53.70%;F(xin)15.37|ԪͬL87.10%;YaҎ(gu)ģ_264.50|ԪͬL77.49%ڹWИI(y)ԇN۞ΣCӰ^СИI(y)ȻF(xin)^õL^